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General Information

Atomic Layer Deposition (ALD) is a thin film deposition method in which a film is grown on a substrate by exposing its surface to alternate gaseous species (typically referred to as precursors). In contrast to chemical vapor deposition, the precursors are never present simultaneously in the reactor, but they are inserted as a series of sequential, non-overlapping pulses. In each of these pulses the precursor molecules react with the surface in a self-limiting way, so that the reaction terminates once all the reactive sites on the surface are consumed. Consequently, the maximum amount of material deposited on the surface after a single exposure to all of the precursors (a so-called ALD cycle) is determined by the nature of the precursor-surface interaction. By varying the number of cycles it is possible to grow materials uniformly and with high precision on arbitrarily complex and large substrates.


Here is a market overview of (R&D) instruments made by specialist manufacturers and companies around the globe.

 

 

ALD Atomic Layer Deposition

Levitech Levitrack ALD

Levitrack ALD system is based on the new concept of precursor separation in space, as opposed to time, in combination with the unique floating wafer...

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Beneq Oy TFS NX300 ALD

The Beneq TFS NX300 is an application-specific system designed for fully-automated industrial production of surface passivation on crystalline...

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NCD Lucida GS200 ALD

Atomic layer deposition ALD system for surface passivation of c-Si solar cells.

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Oxford Instruments OpAL Atomic Layer Deposition

The Oxford Instruments Plasma Technology OpAL system is a compact open-load system designed for Atomic Layer Deposition. It is equipped with a...

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Arradiance GEMStar-8 Benchtop ALD

The 200mm Ø system deposits low temperature conformal metal, semiconductor and insulating films on planar and high aspect ratio (HAR) structures. It...

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Beneq Oy TFS 200

The TFS 200 is the most flexible Atomic Layer Deposition research platform ever designed for research and development. All details of the system are...

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SVT Associates NorthStar ALD-P-100B

SVT Associates' NorthStar Atomic Layer Deposition system is a versatile research deposition tool for thermal or energy enhanced ALD. With up to 8...

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Kurt J.Lesker ALD150LX

ALD150LX ALD Platform – Thermal Atomic Layer Deposition processing for up to 150mm diameter substrates. ALD150LX is a research and pilot production...

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AIXTRON QXP-8300 NVM

Atomic Layer Deposition QXP-8300 Guarantees the Highest Deposition Rate with Excellent Composition Control and Conformality Features - Excellent...

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ASM Pulsar XP ALD

ASM’s Pulsar uses Atomic Layer Deposition to deposit the high-k dielectric materials required for advanced CMOS transistor gates ​and other...

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Beneq Oy TFS 1200

The Beneq TFS 1200 is an application-specific system designed for industrial in-line production of buffer layer coatings on...

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Sundew Developer ALD for Research

Sundew’s Developer line is specifically designed for R&D, yet it uses the same advanced features of our production systems. It is a low-cost...

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Oxford Instruments FlexAL Atomic Layer Deposition

The FlexAL systems provide a new range of flexibility and capability in the engineering of nanoscale structures and devices by offering remote plasma...

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Arradiance GEMStar-6 Benchtop ALD

The 150mm Ø system deposits low temperature conformal metal, semiconductor and insulating films on planar and high aspect ratio (HAR) structures. It...

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SVT Associates NorthStar ALD-P-200B

SVT Associates' NorthStar Atomic Layer Deposition system is a versatile research deposition tool for thermal or energy enhanced ALD. With up to 8...

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Kurt J.Lesker ALD150LE

ALD150LE - Thermal ALD processing for up to 150mm diameter substrates. The Kurt J. Lesker Company ALD150LE is a research level tool for Atomic Layer...

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Picosun R-200 Advanced ALD

PICOSUN R-series Atomic Layer Deposition (ALD) reactors are optimized for research, product development and pilot production. The versatile reactor...

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AIXTRON QXP 8300 ALD

QXP-8300 ALD System Next Generation ALD Product for Dielectric, Metal and NVM Films

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ASM EmerALD XP ALD

EmerALD XP is a process module designed to deposit thin conformal metal and dielectric ​layers by atomic layer deposition (ALD) used for advanced...

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Beneq Oy TFS 600 ALD

The Beneq TFS 600 is an application-specific ALD system designed for vacuum-line integrated organic light-emitting diode (OLED) encapsulation. It...

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myplas PEALD 3D

Plasma enhanced ALD 3D batch sytem.

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Cambridge Nano Tech Phoenix ALD

Phoenix Atomic Layer Deposition is engineered for high throughput and maximum uptime in any fabrication environment, from pilot production to...

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Arradiance GEMStar Benchtop ALD

The product line deposits low temperature conformal metal, semiconductor and insulating films on planar and high aspect ratio (HAR) structures. They...

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ALD Nanosolutions RX

RX ALD uses a rotating bed style, which allows for easier loading and unloading, static dosing, glove box loading, and optional plasma processing....

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