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AIXTRON QXP-8300 NVM

ALD Temperatur Range
Cassette-to-Cassette
ALD Loading
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ALD Substrate Size
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ALD Plasma Enhanced (PEALD)
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ALD Insitu Diagnostics
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ALD Glovebox Integration
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Atomic Layer Deposition QXP-8300 Guarantees the Highest Deposition Rate with Excellent
Composition Control and Conformality
Features
- Excellent gapfill of GST
in >5:1 AR structures in 2x node
- Excellent thickness and
composition control using
vaporizers
- High throughput
- Flexible choice of precursors
using vaporizers

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