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Arradiance GEMStar-8 Benchtop ALD

ALD Temperatur Range
25 - 300 °C
ALD Loading
Top panel with rear facilities interface
ALD Substrate Size
up to 200 mm
ALD Plasma Enhanced (PEALD)
ALD Insitu Diagnostics
ALD Glovebox Integration
The 200mm Ø system deposits low temperature conformal metal, semiconductor and insulating films on planar and high aspect ratio (HAR) structures. It is designed for uniform conformal growth of films from precursors that have a CVD growth component.

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