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Arradiance GEMStar Benchtop ALD

ALD Temperatur Range
25 - 300 °C
ALD Loading
Top panel with rear facilities interface
ALD Substrate Size
100, 150 or 200 mm
ALD Plasma Enhanced (PEALD)
ALD Insitu Diagnostics
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ALD Glovebox Integration
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The product line deposits low temperature conformal metal, semiconductor and insulating films on planar and high aspect ratio (HAR) structures. They are designed for uniform conformal growth of films from precursors that have a CVD growth component.

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