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ASM Pulsar XP ALD

ALD Temperatur Range
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ALD Loading
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ALD Substrate Size
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ALD Plasma Enhanced (PEALD)
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ALD Insitu Diagnostics
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ALD Glovebox Integration
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ASM’s Pulsar uses Atomic Layer Deposition to deposit the high-k dielectric materials required for advanced CMOS transistor gates ​and other applications. Pulsar is the benchmark ALD high-k tool for the industry. It was the first ALD system to be used for high-volume production at advanced customers for high-k metal gate transistors.

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