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Beneq Oy TFS 200R

ALD Temperatur Range
25 - 500 °C
ALD Loading
Manual, Inquire
ALD Substrate Size
up to 300 x 120 mm
ALD Insitu Diagnostics
PLC Control
Beneq's TFS 200R is the first-ever system designed for research in Roll-to-Roll atomic layer deposition (ALD) and other forms of continuous ALD (CALD). The TFS 200R is used exclusively for depositing thin films on flexible substrates. For the first time in ALD history, the TFS 200R enables investigation in the dynamic behavior of various precursor chemistries, simulation of process suitability and evaluation of film performance in Roll-to-Roll ALD applications.

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