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Cambridge Nano Tech Fiji ALD

ALD Temperatur Range
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ALD Loading
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ALD Substrate Size
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ALD Plasma Enhanced (PEALD)
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ALD Insitu Diagnostics
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ALD Glovebox Integration
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Our Fiji series is a modular, high-vacuum ALD system that accommodates a wide range of deposition modes using a flexible architecture and multiple configurations of precursors and plasma gases.

The result is a next-generation ALD system capable of performing thermal and plasma-enhanced deposition.

We applied advanced computational fluid dynamics analyses to optimize the Fiji reactor, heater, and trap geometry.

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