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Kurt J.Lesker ALD150LE

ALD Temperatur Range
up to 500 °C
ALD Loading
Manual, Loadlock
ALD Substrate Size
up to 150 mm
ALD Plasma Enhanced (PEALD)
ALD Insitu Diagnostics
ALD Glovebox Integration
ALD150LE - Thermal ALD processing for up to 150mm diameter substrates. The Kurt J. Lesker Company ALD150LE is a research level tool for Atomic Layer Deposition. With a minimized reactor space and showerhead perpendicular flow reactant input, efficient use of precursors allows superior film properties and cycle times. A small footprint, an industry best software control system with advanced programming capability, uniform heating capabilities, and an array of precursor input options are a few of the key advantages offered in this innovative, best of class design.

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