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Kurt J.Lesker ALD150LX

ALD Temperatur Range
up to 500 °C
ALD Loading
Manual, Loadlock
ALD Substrate Size
up to 150 mm
ALD Plasma Enhanced (PEALD)
ICP
ALD Insitu Diagnostics
Ellipsometer, RGA
ALD Glovebox Integration
ALD150LX ALD Platform – Thermal Atomic Layer Deposition processing for up to 150mm diameter substrates. ALD150LX is a research and pilot production level tool for Atomic Layer Deposition. With a minimized reactor space, Patent Pending Precursor Focusing Technology, and perpendicular flow reactant input, efficient use of precursors allows superior film properties and cycle times. An industry best software control system with advanced programming, uniform heating capabilities, and an array of precursor input options are a few of the key advantages offered in this innovative, best of class design

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