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Levitech Levitrack ALD

Levitrack ALD system is based on the new concept of precursor separation in space, as opposed to time, in combination with the unique floating wafer and conductive heating technology used in the Levitor RTP products.

Substrates are floating in a linear gas track, and are heated to the required process temperature (below 300°C) within a matter of seconds. At process temperature, the substrates float through a series of ALD deposition cells. Each cell consists of 2 precursors, which are separated in space by a Nitrogen purge (acting as inert gas curtains).

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