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NCD Lucida GS200 ALD

ALD Temperatur Range
25 - 250 ℃
ALD Loading
Automatic, Cassette-to-Cassette
ALD Substrate Size
up to 156 x 156 mm
ALD Insitu Diagnostics
inquire
ALD Glovebox Integration
inquire
Atomic layer deposition ALD system for surface passivation of
c-Si solar cells.

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