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Oxford Instruments OpAL Atomic Layer Deposition

ALD Temperatur Range
25 - 400 °C
ALD Loading
Manual
ALD Substrate Size
up to 200 mm
ALD Plasma Enhanced (PEALD)
inquire
ALD Insitu Diagnostics
Ellipsometer
ALD Glovebox Integration
The Oxford Instruments Plasma Technology OpAL system is a compact open-load system designed for Atomic Layer Deposition. It is equipped with a special thermal ALD tool that offers a clear and simple option to upgrade to plasma, providing plasma as well as thermal ALD in a single compact instrument.

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