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Picosun R-200 Standard ALD

ALD Temperatur Range
50 - 500 °C
ALD Loading
Manual, Loadlock
ALD Substrate Size
up to 200 mm
ALD Plasma Enhanced (PEALD)
inquire
ALD Insitu Diagnostics
QCM, RGA
ALD Glovebox Integration
PICOSUN R-series Atomic Layer Deposition (ALD) reactors are optimized for research, product development and pilot production. The versatile reactor design enables deposition on 2-8'' (50-200 mm) wafers, 3-dimensional objects and porous substrates. Reaction chamber materials are selected to withstand corrosive process chemistries. The process tools can be upgraded with various precursor source, reactor chamber and substrate loader options, as well as an ozone delivery system, plasma or a nitrogen generator.

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