We help scientists to compare scientific instruments
PDFPrint

SENTECH PEALD for sensitive substrates

ALD Temperatur Range
low temperatures < 100°C
ALD Loading
Manual, Loadlock
ALD Substrate Size
inquire
ALD Plasma Enhanced (PEALD)
PEALD
ALD Insitu Diagnostics
Ellipsometer, QCM, QMS
ALD Glovebox Integration
Optional
SENTECH atomic layer deposition systems enable thermal and plasma enhanced operation. The ALD systems can be configured for oxide, nitride, and metal deposition. 3D structures can be homogenously and conformally coated. With ALD, PECVD and ICPECVD, SENTECH offers plasma deposition technology for depositing films from the nanometer scale up to several microns.

ABOUT Science Duel Life

science.duel.life & mynexttool Is a Free-Access Scientific Instrument Database.

Accurate and truthful parameter filters for all instruments and manufacturers provide a positive experience to our users.

CONTACT

New York, NY

Berlin, Germany

CUSTOMER SUPPORT

Come back tomorrow for more.