We help scientists to compare scientific instruments
Compare Instruments

Select any of the instruments below. To compare, check the "Compare" check box of two or more instruments and click "Compare".

General Information

Atomic Layer Deposition (ALD) is a thin film deposition method in which a film is grown on a substrate by exposing its surface to alternate gaseous species (typically referred to as precursors). In contrast to chemical vapor deposition, the precursors are never present simultaneously in the reactor, but they are inserted as a series of sequential, non-overlapping pulses. In each of these pulses the precursor molecules react with the surface in a self-limiting way, so that the reaction terminates once all the reactive sites on the surface are consumed. Consequently, the maximum amount of material deposited on the surface after a single exposure to all of the precursors (a so-called ALD cycle) is determined by the nature of the precursor-surface interaction. By varying the number of cycles it is possible to grow materials uniformly and with high precision on arbitrarily complex and large substrates.


Here is a market overview of (R&D) instruments made by specialist manufacturers and companies around the globe.

 

 

ALD Atomic Layer Deposition

Beneq Oy TFS P400A and P800 ALD

The Beneq P400A and P800 are ALD systems designed for industrial-scale production. They are ideal tools for scaling-up thin film deposition from R&D...

Details

NCD Lucida D series ALD

Atomic layer deposition system for R&D applications.

Details

Aviza Technology Celsior fxP ALD

Celsior fxP is Aviza’s advanced generation single wafer ALD system targeted for 300-mm production at the 90-nm node and below. Celsior fxP offers...

Details

Arradiance GEMStar-A Benchtop Controlled Gas Environment Anneal System

The 200mm square system anneals substrates in a vacuum controlled user selectable gas environment.

Details

Beneq Oy TFS 200R

Beneq's TFS 200R is the first-ever system designed for research in Roll-to-Roll atomic layer deposition (ALD) and other forms of continuous ALD...

Details

myplas ALD thermal ALD

Thermal Atomic Layer Deposition System.

Details

Cambridge Nano Tech Savannah ALD

Ultratech/Cambridge NanoTech is the leading provider of atomic layer deposition (ALD) systems for research and industry worldwide, delivering...

Details

SENTECH PEALD for sensitive substrates

SENTECH atomic layer deposition systems enable thermal and plasma enhanced operation. The ALD systems can be configured for oxide, nitride, and metal...

Details

Levitech Levitrack ALD

Levitrack ALD system is based on the new concept of precursor separation in space, as opposed to time, in combination with the unique floating wafer...

Details

Beneq Oy TFS NX300 ALD

The Beneq TFS NX300 is an application-specific system designed for fully-automated industrial production of surface passivation on crystalline...

Details

NCD Lucida GS200 ALD

Atomic layer deposition ALD system for surface passivation of c-Si solar cells.

Details

Oxford Instruments OpAL Atomic Layer Deposition

The Oxford Instruments Plasma Technology OpAL system is a compact open-load system designed for Atomic Layer Deposition. It is equipped with a...

Details

Arradiance GEMStar-8 Benchtop ALD

The 200mm Ø system deposits low temperature conformal metal, semiconductor and insulating films on planar and high aspect ratio (HAR) structures. It...

Details

Beneq Oy TFS 200

The TFS 200 is the most flexible Atomic Layer Deposition research platform ever designed for research and development. All details of the system are...

Details

SVT Associates NorthStar ALD-P-100B

SVT Associates' NorthStar Atomic Layer Deposition system is a versatile research deposition tool for thermal or energy enhanced ALD. With up to 8...

Details

Kurt J.Lesker ALD150LX

ALD150LX ALD Platform – Thermal Atomic Layer Deposition processing for up to 150mm diameter substrates. ALD150LX is a research and pilot production...

Details

AIXTRON QXP-8300 NVM

Atomic Layer Deposition QXP-8300 Guarantees the Highest Deposition Rate with Excellent Composition Control and Conformality Features - Excellent...

Details

ASM Pulsar XP ALD

ASM’s Pulsar uses Atomic Layer Deposition to deposit the high-k dielectric materials required for advanced CMOS transistor gates ​and other...

Details

Beneq Oy TFS 1200

The Beneq TFS 1200 is an application-specific system designed for industrial in-line production of buffer layer coatings on...

Details

Sundew Developer ALD for Research

Sundew’s Developer line is specifically designed for R&D, yet it uses the same advanced features of our production systems. It is a low-cost...

Details

Oxford Instruments FlexAL Atomic Layer Deposition

The FlexAL systems provide a new range of flexibility and capability in the engineering of nanoscale structures and devices by offering remote plasma...

Details

Arradiance GEMStar-6 Benchtop ALD

The 150mm Ø system deposits low temperature conformal metal, semiconductor and insulating films on planar and high aspect ratio (HAR) structures. It...

Details

SVT Associates NorthStar ALD-P-200B

SVT Associates' NorthStar Atomic Layer Deposition system is a versatile research deposition tool for thermal or energy enhanced ALD. With up to 8...

Details

Kurt J.Lesker ALD150LE

ALD150LE - Thermal ALD processing for up to 150mm diameter substrates. The Kurt J. Lesker Company ALD150LE is a research level tool for Atomic Layer...

Details

Page 1 of 2

ABOUT Science Duel Life

science.duel.life & mynexttool Is a Free-Access Scientific Instrument Database.

Accurate and truthful parameter filters for all instruments and manufacturers provide a positive experience to our users.

CONTACT

New York, NY

Berlin, Germany

CUSTOMER SUPPORT

Come back tomorrow for more.