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General Information

Atomic Layer Deposition (ALD) is a thin film deposition method in which a film is grown on a substrate by exposing its surface to alternate gaseous species (typically referred to as precursors). In contrast to chemical vapor deposition, the precursors are never present simultaneously in the reactor, but they are inserted as a series of sequential, non-overlapping pulses. In each of these pulses the precursor molecules react with the surface in a self-limiting way, so that the reaction terminates once all the reactive sites on the surface are consumed. Consequently, the maximum amount of material deposited on the surface after a single exposure to all of the precursors (a so-called ALD cycle) is determined by the nature of the precursor-surface interaction. By varying the number of cycles it is possible to grow materials uniformly and with high precision on arbitrarily complex and large substrates.

Here is a market overview of (R&D) instruments made by specialist manufacturers and companies around the globe.



ALD Atomic Layer Deposition

SVT Associates NorthStar ALD-P-200B

SVT Associates' NorthStar Atomic Layer Deposition system is a versatile research deposition tool for thermal or energy enhanced ALD. With up to 8...


Kurt J.Lesker ALD150LE

ALD150LE - Thermal ALD processing for up to 150mm diameter substrates. The Kurt J. Lesker Company ALD150LE is a research level tool for Atomic Layer...


Picosun R-200 Advanced ALD

PICOSUN R-series Atomic Layer Deposition (ALD) reactors are optimized for research, product development and pilot production. The versatile reactor...



QXP-8300 ALD System Next Generation ALD Product for Dielectric, Metal and NVM Films



EmerALD XP is a process module designed to deposit thin conformal metal and dielectric ​layers by atomic layer deposition (ALD) used for advanced...


Beneq Oy TFS 600 ALD

The Beneq TFS 600 is an application-specific ALD system designed for vacuum-line integrated organic light-emitting diode (OLED) encapsulation. It...


myplas PEALD 3D

Plasma enhanced ALD 3D batch sytem.


Cambridge Nano Tech Phoenix ALD

Phoenix Atomic Layer Deposition is engineered for high throughput and maximum uptime in any fabrication environment, from pilot production to...


Arradiance GEMStar Benchtop ALD

The product line deposits low temperature conformal metal, semiconductor and insulating films on planar and high aspect ratio (HAR) structures. They...


ALD Nanosolutions RX

RX ALD uses a rotating bed style, which allows for easier loading and unloading, static dosing, glove box loading, and optional plasma processing....


Beneq Oy TFS WCS 600

Beneq’s achievements in Atomic Layer Deposition are undisputed. Our urge to develop the best ALD tools for research and industry has seen us...


NCD Lucida M 100-PL ALD

Plasma enhanced atomic layer deposition system for R&D applications.


Picosun R-200 Standard ALD

PICOSUN R-series Atomic Layer Deposition (ALD) reactors are optimized for research, product development and pilot production. The versatile reactor...


Nanomaster NLD-4000

NLD-4000 is a stand alone, PC controlled ALD system with LabVIEW software featuring four levels password-controlled user authorization. The system is...


Beneq Oy TFS 500

Atomic Layer Deposition TFS 500 is designed for diverse use in thin film coating applications. Being the first Beneq reactor model, has proven its...


myplas PEALD

Plasma enhanced thermal ALD.


Cambridge Nano Tech Fiji ALD

Our Fiji series is a modular, high-vacuum ALD system that accommodates a wide range of deposition modes using a flexible architecture and multiple...


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