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General Information

Atomic Layer Deposition (ALD) is a thin film deposition method in which a film is grown on a substrate by exposing its surface to alternate gaseous species (typically referred to as precursors). In contrast to chemical vapor deposition, the precursors are never present simultaneously in the reactor, but they are inserted as a series of sequential, non-overlapping pulses. In each of these pulses the precursor molecules react with the surface in a self-limiting way, so that the reaction terminates once all the reactive sites on the surface are consumed. Consequently, the maximum amount of material deposited on the surface after a single exposure to all of the precursors (a so-called ALD cycle) is determined by the nature of the precursor-surface interaction. By varying the number of cycles it is possible to grow materials uniformly and with high precision on arbitrarily complex and large substrates.


Here is a market overview of (R&D) instruments made by specialist manufacturers and companies around the globe.

 

 

ALD Atomic Layer Deposition

Kurt J.Lesker ALD150LX

ALD150LX ALD Platform – Thermal Atomic Layer Deposition processing for up to 150mm diameter substrates. ALD150LX is a research and pilot production...

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Levitech Levitrack ALD

Levitrack ALD system is based on the new concept of precursor separation in space, as opposed to time, in combination with the unique floating wafer...

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myplas ALD thermal ALD

Thermal Atomic Layer Deposition System.

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myplas PEALD

Plasma enhanced thermal ALD.

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myplas PEALD 3D

Plasma enhanced ALD 3D batch sytem.

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Nanomaster NLD-4000

NLD-4000 is a stand alone, PC controlled ALD system with LabVIEW software featuring four levels password-controlled user authorization. The system is...

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NCD Lucida GS200 ALD

Atomic layer deposition ALD system for surface passivation of c-Si solar cells.

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NCD Lucida D series ALD

Atomic layer deposition system for R&D applications.

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NCD Lucida M 100-PL ALD

Plasma enhanced atomic layer deposition system for R&D applications.

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Oxford Instruments FlexAL Atomic Layer Deposition

The FlexAL systems provide a new range of flexibility and capability in the engineering of nanoscale structures and devices by offering remote plasma...

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Oxford Instruments OpAL Atomic Layer Deposition

The Oxford Instruments Plasma Technology OpAL system is a compact open-load system designed for Atomic Layer Deposition. It is equipped with a...

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Picosun R-200 Advanced ALD

PICOSUN R-series Atomic Layer Deposition (ALD) reactors are optimized for research, product development and pilot production. The versatile reactor...

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Picosun R-200 Standard ALD

PICOSUN R-series Atomic Layer Deposition (ALD) reactors are optimized for research, product development and pilot production. The versatile reactor...

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SENTECH PEALD for sensitive substrates

SENTECH atomic layer deposition systems enable thermal and plasma enhanced operation. The ALD systems can be configured for oxide, nitride, and metal...

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Sundew Developer ALD for Research

Sundew’s Developer line is specifically designed for R&D, yet it uses the same advanced features of our production systems. It is a low-cost...

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SVT Associates NorthStar ALD-P-200B

SVT Associates' NorthStar Atomic Layer Deposition system is a versatile research deposition tool for thermal or energy enhanced ALD. With up to 8...

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SVT Associates NorthStar ALD-P-100B

SVT Associates' NorthStar Atomic Layer Deposition system is a versatile research deposition tool for thermal or energy enhanced ALD. With up to 8...

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