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General Information

Atomic Layer Deposition (ALD) is a thin film deposition method in which a film is grown on a substrate by exposing its surface to alternate gaseous species (typically referred to as precursors). In contrast to chemical vapor deposition, the precursors are never present simultaneously in the reactor, but they are inserted as a series of sequential, non-overlapping pulses. In each of these pulses the precursor molecules react with the surface in a self-limiting way, so that the reaction terminates once all the reactive sites on the surface are consumed. Consequently, the maximum amount of material deposited on the surface after a single exposure to all of the precursors (a so-called ALD cycle) is determined by the nature of the precursor-surface interaction. By varying the number of cycles it is possible to grow materials uniformly and with high precision on arbitrarily complex and large substrates.

Here is a market overview of (R&D) instruments made by specialist manufacturers and companies around the globe.



ALD Atomic Layer Deposition


Atomic Layer Deposition QXP-8300 Guarantees the Highest Deposition Rate with Excellent Composition Control and Conformality Features - Excellent...



QXP-8300 ALD System Next Generation ALD Product for Dielectric, Metal and NVM Films


ALD Nanosolutions FBX

FBX offers the well characterized fluidized bed processing vessel; widely used, easy scaled, and excellent for thermal ALD.


ALD Nanosolutions RX

RX ALD uses a rotating bed style, which allows for easier loading and unloading, static dosing, glove box loading, and optional plasma processing....


Arradiance GEMStar-A Benchtop Controlled Gas Environment Anneal System

The 200mm square system anneals substrates in a vacuum controlled user selectable gas environment.


Arradiance GEMStar XT Benchtop ALD

GEMStar XT offers Benchtop Thermal ALD and Plasma Enhanced PEALD systems with reactors specifically tailored for multiple 100, 150 or 200 mm round or...


Arradiance GEMStar Benchtop ALD

The product line deposits low temperature conformal metal, semiconductor and insulating films on planar and high aspect ratio (HAR) structures. They...


Arradiance GEMStar-6 Benchtop ALD

The 150mm Ø system deposits low temperature conformal metal, semiconductor and insulating films on planar and high aspect ratio (HAR) structures. It...


Arradiance GEMStar-8 Benchtop ALD

The 200mm Ø system deposits low temperature conformal metal, semiconductor and insulating films on planar and high aspect ratio (HAR) structures. It...



EmerALD XP is a process module designed to deposit thin conformal metal and dielectric ​layers by atomic layer deposition (ALD) used for advanced...



ASM’s Pulsar uses Atomic Layer Deposition to deposit the high-k dielectric materials required for advanced CMOS transistor gates ​and other...


Aviza Technology Celsior fxP ALD

Celsior fxP is Aviza’s advanced generation single wafer ALD system targeted for 300-mm production at the 90-nm node and below. Celsior fxP offers...


Beneq Oy TFS NX300 ALD

The Beneq TFS NX300 is an application-specific system designed for fully-automated industrial production of surface passivation on crystalline...


Beneq Oy TFS P400A and P800 ALD

The Beneq P400A and P800 are ALD systems designed for industrial-scale production. They are ideal tools for scaling-up thin film deposition from R&D...


Beneq Oy TFS 200

The TFS 200 is the most flexible Atomic Layer Deposition research platform ever designed for research and development. All details of the system are...


Beneq Oy TFS WCS 600

Beneq’s achievements in Atomic Layer Deposition are undisputed. Our urge to develop the best ALD tools for research and industry has seen us...


Beneq Oy TFS 200R

Beneq's TFS 200R is the first-ever system designed for research in Roll-to-Roll atomic layer deposition (ALD) and other forms of continuous ALD...


Beneq Oy TFS 500

Atomic Layer Deposition TFS 500 is designed for diverse use in thin film coating applications. Being the first Beneq reactor model, has proven its...


Beneq Oy TFS 600 ALD

The Beneq TFS 600 is an application-specific ALD system designed for vacuum-line integrated organic light-emitting diode (OLED) encapsulation. It...


Beneq Oy TFS 1200

The Beneq TFS 1200 is an application-specific system designed for industrial in-line production of buffer layer coatings on...


Cambridge Nano Tech Phoenix ALD

Phoenix Atomic Layer Deposition is engineered for high throughput and maximum uptime in any fabrication environment, from pilot production to...


Cambridge Nano Tech Savannah ALD

Ultratech/Cambridge NanoTech is the leading provider of atomic layer deposition (ALD) systems for research and industry worldwide, delivering...


Cambridge Nano Tech Fiji ALD

Our Fiji series is a modular, high-vacuum ALD system that accommodates a wide range of deposition modes using a flexible architecture and multiple...


Kurt J.Lesker ALD150LE

ALD150LE - Thermal ALD processing for up to 150mm diameter substrates. The Kurt J. Lesker Company ALD150LE is a research level tool for Atomic Layer...


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