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General Information

Atomic Layer Deposition (ALD) is a thin film deposition method in which a film is grown on a substrate by exposing its surface to alternate gaseous species (typically referred to as precursors). In contrast to chemical vapor deposition, the precursors are never present simultaneously in the reactor, but they are inserted as a series of sequential, non-overlapping pulses. In each of these pulses the precursor molecules react with the surface in a self-limiting way, so that the reaction terminates once all the reactive sites on the surface are consumed. Consequently, the maximum amount of material deposited on the surface after a single exposure to all of the precursors (a so-called ALD cycle) is determined by the nature of the precursor-surface interaction. By varying the number of cycles it is possible to grow materials uniformly and with high precision on arbitrarily complex and large substrates.


Here is a market overview of (R&D) instruments made by specialist manufacturers and companies around the globe.

 

 

ALD Atomic Layer Deposition

myplas PEALD 3D

Plasma enhanced ALD 3D batch sytem.

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Oxford Instruments OpAL Atomic Layer Deposition

The Oxford Instruments Plasma Technology OpAL system is a compact open-load system designed for Atomic Layer Deposition. It is equipped with a...

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Sundew Developer ALD for Research

Sundew’s Developer line is specifically designed for R&D, yet it uses the same advanced features of our production systems. It is a low-cost...

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Aviza Technology Celsior fxP ALD

Celsior fxP is Aviza’s advanced generation single wafer ALD system targeted for 300-mm production at the 90-nm node and below. Celsior fxP offers...

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NCD Lucida GS200 ALD

Atomic layer deposition ALD system for surface passivation of c-Si solar cells.

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Picosun R-200 Standard ALD

PICOSUN R-series Atomic Layer Deposition (ALD) reactors are optimized for research, product development and pilot production. The versatile reactor...

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NCD Lucida D series ALD

Atomic layer deposition system for R&D applications.

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AIXTRON QXP 8300 ALD

QXP-8300 ALD System Next Generation ALD Product for Dielectric, Metal and NVM Films

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NCD Lucida M 100-PL ALD

Plasma enhanced atomic layer deposition system for R&D applications.

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AIXTRON QXP-8300 NVM

Atomic Layer Deposition QXP-8300 Guarantees the Highest Deposition Rate with Excellent Composition Control and Conformality Features - Excellent...

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Picosun R-200 Advanced ALD

PICOSUN R-series Atomic Layer Deposition (ALD) reactors are optimized for research, product development and pilot production. The versatile reactor...

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SENTECH PEALD for sensitive substrates

SENTECH atomic layer deposition systems enable thermal and plasma enhanced operation. The ALD systems can be configured for oxide, nitride, and metal...

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Arradiance GEMStar XT Benchtop ALD

GEMStar XT offers Benchtop Thermal ALD and Plasma Enhanced PEALD systems with reactors specifically tailored for multiple 100, 150 or 200 mm round or...

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Arradiance GEMStar Benchtop ALD

The product line deposits low temperature conformal metal, semiconductor and insulating films on planar and high aspect ratio (HAR) structures. They...

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Beneq Oy TFS 200

The TFS 200 is the most flexible Atomic Layer Deposition research platform ever designed for research and development. All details of the system are...

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Arradiance GEMStar-6 Benchtop ALD

The 150mm Ø system deposits low temperature conformal metal, semiconductor and insulating films on planar and high aspect ratio (HAR) structures. It...

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Beneq Oy TFS 200R

Beneq's TFS 200R is the first-ever system designed for research in Roll-to-Roll atomic layer deposition (ALD) and other forms of continuous ALD...

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Arradiance GEMStar-8 Benchtop ALD

The 200mm Ø system deposits low temperature conformal metal, semiconductor and insulating films on planar and high aspect ratio (HAR) structures. It...

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Beneq Oy TFS 500

Atomic Layer Deposition TFS 500 is designed for diverse use in thin film coating applications. Being the first Beneq reactor model, has proven its...

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Arradiance GEMStar-A Benchtop Controlled Gas Environment Anneal System

The 200mm square system anneals substrates in a vacuum controlled user selectable gas environment.

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Beneq Oy TFS 600 ALD

The Beneq TFS 600 is an application-specific ALD system designed for vacuum-line integrated organic light-emitting diode (OLED) encapsulation. It...

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Nanomaster NLD-4000

NLD-4000 is a stand alone, PC controlled ALD system with LabVIEW software featuring four levels password-controlled user authorization. The system is...

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Beneq Oy TFS 1200

The Beneq TFS 1200 is an application-specific system designed for industrial in-line production of buffer layer coatings on...

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ASM EmerALD XP ALD

EmerALD XP is a process module designed to deposit thin conformal metal and dielectric ​layers by atomic layer deposition (ALD) used for advanced...

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