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General Information

Atomic Layer Deposition (ALD) is a thin film deposition method in which a film is grown on a substrate by exposing its surface to alternate gaseous species (typically referred to as precursors). In contrast to chemical vapor deposition, the precursors are never present simultaneously in the reactor, but they are inserted as a series of sequential, non-overlapping pulses. In each of these pulses the precursor molecules react with the surface in a self-limiting way, so that the reaction terminates once all the reactive sites on the surface are consumed. Consequently, the maximum amount of material deposited on the surface after a single exposure to all of the precursors (a so-called ALD cycle) is determined by the nature of the precursor-surface interaction. By varying the number of cycles it is possible to grow materials uniformly and with high precision on arbitrarily complex and large substrates.

Here is a market overview of (R&D) instruments made by specialist manufacturers and companies around the globe.



ALD Atomic Layer Deposition

Beneq Oy TFS 1200

The Beneq TFS 1200 is an application-specific system designed for industrial in-line production of buffer layer coatings on...



EmerALD XP is a process module designed to deposit thin conformal metal and dielectric ​layers by atomic layer deposition (ALD) used for advanced...


Beneq Oy TFS NX300 ALD

The Beneq TFS NX300 is an application-specific system designed for fully-automated industrial production of surface passivation on crystalline...



ASM’s Pulsar uses Atomic Layer Deposition to deposit the high-k dielectric materials required for advanced CMOS transistor gates ​and other...


Beneq Oy TFS P400A and P800 ALD

The Beneq P400A and P800 are ALD systems designed for industrial-scale production. They are ideal tools for scaling-up thin film deposition from R&D...


Levitech Levitrack ALD

Levitrack ALD system is based on the new concept of precursor separation in space, as opposed to time, in combination with the unique floating wafer...


Beneq Oy TFS WCS 600

Beneq’s achievements in Atomic Layer Deposition are undisputed. Our urge to develop the best ALD tools for research and industry has seen us...


ALD Nanosolutions FBX

FBX offers the well characterized fluidized bed processing vessel; widely used, easy scaled, and excellent for thermal ALD.


Kurt J.Lesker ALD150LE

ALD150LE - Thermal ALD processing for up to 150mm diameter substrates. The Kurt J. Lesker Company ALD150LE is a research level tool for Atomic Layer...


ALD Nanosolutions RX

RX ALD uses a rotating bed style, which allows for easier loading and unloading, static dosing, glove box loading, and optional plasma processing....


Kurt J.Lesker ALD150LX

ALD150LX ALD Platform – Thermal Atomic Layer Deposition processing for up to 150mm diameter substrates. ALD150LX is a research and pilot production...


SVT Associates NorthStar ALD-P-200B

SVT Associates' NorthStar Atomic Layer Deposition system is a versatile research deposition tool for thermal or energy enhanced ALD. With up to 8...


Cambridge Nano Tech Savannah ALD

Ultratech/Cambridge NanoTech is the leading provider of atomic layer deposition (ALD) systems for research and industry worldwide, delivering...


SVT Associates NorthStar ALD-P-100B

SVT Associates' NorthStar Atomic Layer Deposition system is a versatile research deposition tool for thermal or energy enhanced ALD. With up to 8...


Cambridge Nano Tech Fiji ALD

Our Fiji series is a modular, high-vacuum ALD system that accommodates a wide range of deposition modes using a flexible architecture and multiple...


myplas ALD thermal ALD

Thermal Atomic Layer Deposition System.


Cambridge Nano Tech Phoenix ALD

Phoenix Atomic Layer Deposition is engineered for high throughput and maximum uptime in any fabrication environment, from pilot production to...


myplas PEALD

Plasma enhanced thermal ALD.


Oxford Instruments FlexAL Atomic Layer Deposition

The FlexAL systems provide a new range of flexibility and capability in the engineering of nanoscale structures and devices by offering remote plasma...


myplas PEALD 3D

Plasma enhanced ALD 3D batch sytem.


Oxford Instruments OpAL Atomic Layer Deposition

The Oxford Instruments Plasma Technology OpAL system is a compact open-load system designed for Atomic Layer Deposition. It is equipped with a...


Sundew Developer ALD for Research

Sundew’s Developer line is specifically designed for R&D, yet it uses the same advanced features of our production systems. It is a low-cost...


Aviza Technology Celsior fxP ALD

Celsior fxP is Aviza’s advanced generation single wafer ALD system targeted for 300-mm production at the 90-nm node and below. Celsior fxP offers...


NCD Lucida GS200 ALD

Atomic layer deposition ALD system for surface passivation of c-Si solar cells.


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