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General Information

Atomic Layer Deposition (ALD) is a thin film deposition method in which a film is grown on a substrate by exposing its surface to alternate gaseous species (typically referred to as precursors). In contrast to chemical vapor deposition, the precursors are never present simultaneously in the reactor, but they are inserted as a series of sequential, non-overlapping pulses. In each of these pulses the precursor molecules react with the surface in a self-limiting way, so that the reaction terminates once all the reactive sites on the surface are consumed. Consequently, the maximum amount of material deposited on the surface after a single exposure to all of the precursors (a so-called ALD cycle) is determined by the nature of the precursor-surface interaction. By varying the number of cycles it is possible to grow materials uniformly and with high precision on arbitrarily complex and large substrates.


Here is a market overview of (R&D) instruments made by specialist manufacturers and companies around the globe.

 

 

Beneq Oy

Beneq Oy TFS P400A and P800 ALD

The Beneq P400A and P800 are ALD systems designed for industrial-scale production. They are ideal tools for scaling-up thin film deposition from R&D...

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Beneq Oy TFS 200R

Beneq's TFS 200R is the first-ever system designed for research in Roll-to-Roll atomic layer deposition (ALD) and other forms of continuous ALD...

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Beneq Oy TFS NX300 ALD

The Beneq TFS NX300 is an application-specific system designed for fully-automated industrial production of surface passivation on crystalline...

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Beneq Oy TFS 200

The TFS 200 is the most flexible Atomic Layer Deposition research platform ever designed for research and development. All details of the system are...

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Beneq Oy TFS 1200

The Beneq TFS 1200 is an application-specific system designed for industrial in-line production of buffer layer coatings on...

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Beneq Oy TFS 600 ALD

The Beneq TFS 600 is an application-specific ALD system designed for vacuum-line integrated organic light-emitting diode (OLED) encapsulation. It...

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Beneq Oy TFS WCS 600

Beneq’s achievements in Atomic Layer Deposition are undisputed. Our urge to develop the best ALD tools for research and industry has seen us...

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Beneq Oy TFS 500

Atomic Layer Deposition TFS 500 is designed for diverse use in thin film coating applications. Being the first Beneq reactor model, has proven its...

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