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Ellipsometry is an optical technique for investigating the dielectric properties (complex refractive index or dielectric function) of thin films. Ellipsometry can be used to characterize composition, roughness, thickness (depth), crystalline nature, doping concentration, electrical conductivity and other material properties. It is very sensitive to the change in the optical response of incident radiation that interacts with the material being investigated.
Typically, the measured signal is the change in polarization as the incident radiation (in a known state) interacts with the material structure of interest (reflected, absorbed, scattered, or transmitted). The polarization change is quantified by the amplitude ratio, Ψ, and the phase difference, Δ (defined below). Because the signal depends on the thickness as well as the materials properties, ellipsometry can be a universal tool  for contact free determination of thickness and optical constants of films of all kinds.
Here is a market overview of instruments made by specialist manufacturers and companies around the globe.
High speed film thickness mapping system automatically measures each site at 70° with a red laser and 60° incident angle with a green laser. It is a...
Offers a 15 micron measuring laser beam diameter, manual 2x2 inch micrometer positioning stage and a CCD camera for viewing the area of measurement...
A super fast, reliable, no moving parts ellipsometer that is ideal for measuring the rapid growing or etching of films in situ within your reactor....