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Gerneral Information

Ellipsometry is an optical technique for investigating the dielectric properties (complex refractive index or dielectric function) of thin films. Ellipsometry can be used to characterize composition, roughness, thickness (depth), crystalline nature, doping concentration, electrical conductivity and other material properties. It is very sensitive to the change in the optical response of incident radiation that interacts with the material being investigated.

Typically, the measured signal is the change in polarization as the incident radiation (in a known state) interacts with the material structure of interest (reflected, absorbed, scattered, or transmitted). The polarization change is quantified by the amplitude ratio, Ψ, and the phase difference, Δ (defined below). Because the signal depends on the thickness as well as the materials properties, ellipsometry can be a universal tool [1] for contact free determination of thickness and optical constants of films of all kinds.

Here is a market overview of instruments made by specialist manufacturers and companies around the globe.

Ellipsometer

SENTECH SENresearch

The SENresearch spectroscopic ellipsometer family covers the widest spectral range from 190 nm (deep UV) to 3,500 nm (NIR) in one tool. FTIR is...

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J.A. Wollham IR-VASE

Covers a wide spectral range from 2 to 30 microns. This ellipsometer is used to characterize both thin films and bulk materials.

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SEMILAB SE 2000

Spectroscopic Ellipsometry for thin film thickness and optical functions, including complex multilayer structures Generalized Ellipsometry for...

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SENTECH SENDIRA FTIR

Ellipsometric vibrational spectroscopy: The composition of thin layers is analyzed using the absorption bands of molecular vibrational modes in the...

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