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Ellipsometry is an optical technique for investigating the dielectric properties (complex refractive index or dielectric function) of thin films. Ellipsometry can be used to characterize composition, roughness, thickness (depth), crystalline nature, doping concentration, electrical conductivity and other material properties. It is very sensitive to the change in the optical response of incident radiation that interacts with the material being investigated.
Typically, the measured signal is the change in polarization as the incident radiation (in a known state) interacts with the material structure of interest (reflected, absorbed, scattered, or transmitted). The polarization change is quantified by the amplitude ratio, Ψ, and the phase difference, Δ (defined below). Because the signal depends on the thickness as well as the materials properties, ellipsometry can be a universal tool  for contact free determination of thickness and optical constants of films of all kinds.
Here is a market overview of instruments made by specialist manufacturers and companies around the globe.
The LSE –TRAVELER is designed to be shipped or checked as airline luggage, the rugged LSE-TRAVELER fits into a airline safe foam filled travel case...
Automatically measures with both a red laser at 70° and green laser at 60° incidence angle. The 2 angle 2 wave capability determines thicker film...
This is a manually operated experimental demonstrator of ellipsometry. An input beam of random polarization is first transferred to a linearly...