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Gerneral Information

Ellipsometry is an optical technique for investigating the dielectric properties (complex refractive index or dielectric function) of thin films. Ellipsometry can be used to characterize composition, roughness, thickness (depth), crystalline nature, doping concentration, electrical conductivity and other material properties. It is very sensitive to the change in the optical response of incident radiation that interacts with the material being investigated.

Typically, the measured signal is the change in polarization as the incident radiation (in a known state) interacts with the material structure of interest (reflected, absorbed, scattered, or transmitted). The polarization change is quantified by the amplitude ratio, Ψ, and the phase difference, Δ (defined below). Because the signal depends on the thickness as well as the materials properties, ellipsometry can be a universal tool [1] for contact free determination of thickness and optical constants of films of all kinds.

Here is a market overview of instruments made by specialist manufacturers and companies around the globe.


Gaertner Scientific In Situ Stokes Ellipsometer L104ST

A super fast, reliable, no moving parts ellipsometer that is ideal for measuring the rapid growing or etching of films in situ within your reactor....


J.A. Wollam RC2

Dual rotating compensator technology gives the ability to determine all 16 Mueller Matrix elements.


Entrepix Focus FE-IV

The Rudolph FE IV Focus Ellipsometer is designed to provide precision film thickness measurements with simplicity of use. The system's long-life HeNe...


Horiba UVISEL Extended Range

Ideal for non-destructive, accurate, and versatile thin film characterization in research and industry. UVISEL ER: 190-2100 nm.


Accurion nanofilm_ep4 as Laser Setup

A selection of different lasers are available as a first and only light source in your single wavelength instrument. It can also been selected as a...


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