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Gerneral Information

Ellipsometry is an optical technique for investigating the dielectric properties (complex refractive index or dielectric function) of thin films. Ellipsometry can be used to characterize composition, roughness, thickness (depth), crystalline nature, doping concentration, electrical conductivity and other material properties. It is very sensitive to the change in the optical response of incident radiation that interacts with the material being investigated.

Typically, the measured signal is the change in polarization as the incident radiation (in a known state) interacts with the material structure of interest (reflected, absorbed, scattered, or transmitted). The polarization change is quantified by the amplitude ratio, Ψ, and the phase difference, Δ (defined below). Because the signal depends on the thickness as well as the materials properties, ellipsometry can be a universal tool [1] for contact free determination of thickness and optical constants of films of all kinds.

Here is a market overview of instruments made by specialist manufacturers and companies around the globe.


SCI FilmTek 4000

FilmTek 4000 is our most advanced model for thick-film applications. It incorporates multiple detectors positioned at different angles of incidence -...



Combined Ellipsometry Reflectometry: The combination of ellipsometry and reflectometry allows for fast and unambiguous determination of the...


SCI FilmTek SE

The FilmTek SE is a high performance spectroscopic ellipsometer for thin film characterization that measures from the deep UV to NIR (190 - 1700 nm).


J.A. Wollham IR-VASE

Covers a wide spectral range from 2 to 30 microns. This ellipsometer is used to characterize both thin films and bulk materials.


Anstrom Sun SE200BA-MSP

Wavelength range: 250 to 1000 nm for SE and 400 to 850nm for MSP


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