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Gerneral Information

Ellipsometry is an optical technique for investigating the dielectric properties (complex refractive index or dielectric function) of thin films. Ellipsometry can be used to characterize composition, roughness, thickness (depth), crystalline nature, doping concentration, electrical conductivity and other material properties. It is very sensitive to the change in the optical response of incident radiation that interacts with the material being investigated.

Typically, the measured signal is the change in polarization as the incident radiation (in a known state) interacts with the material structure of interest (reflected, absorbed, scattered, or transmitted). The polarization change is quantified by the amplitude ratio, Ψ, and the phase difference, Δ (defined below). Because the signal depends on the thickness as well as the materials properties, ellipsometry can be a universal tool [1] for contact free determination of thickness and optical constants of films of all kinds.

Here is a market overview of instruments made by specialist manufacturers and companies around the globe.

SCI Scientific Computing International

SCI FilmTek Solar 1000 UV

FilmTek Solar / 1000 UV is an accurate and economical film thickness measurement system that is designed specifically for textured substrates. ...

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SCI FilmTek 1000

FilmTek 1000 is an accurate and economical film thickness measurement system. It combines a fiber-optic spectrophotometer with revolutionary...

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SCI FilmTek 2000

FilmTek 2000 combines a fiber-optic spectrophotometer with revolutionary material modeling software to provide an affordable and reliable tool for...

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SCI FilmTek 4000

FilmTek 4000 is our most advanced model for thick-film applications. It incorporates multiple detectors positioned at different angles of incidence -...

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SCI FilmTek SE

The FilmTek SE is a high performance spectroscopic ellipsometer for thin film characterization that measures from the deep UV to NIR (190 - 1700 nm).

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