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Gerneral Information

Ellipsometry is an optical technique for investigating the dielectric properties (complex refractive index or dielectric function) of thin films. Ellipsometry can be used to characterize composition, roughness, thickness (depth), crystalline nature, doping concentration, electrical conductivity and other material properties. It is very sensitive to the change in the optical response of incident radiation that interacts with the material being investigated.

Typically, the measured signal is the change in polarization as the incident radiation (in a known state) interacts with the material structure of interest (reflected, absorbed, scattered, or transmitted). The polarization change is quantified by the amplitude ratio, Ψ, and the phase difference, Δ (defined below). Because the signal depends on the thickness as well as the materials properties, ellipsometry can be a universal tool [1] for contact free determination of thickness and optical constants of films of all kinds.

Here is a market overview of instruments made by specialist manufacturers and companies around the globe.

Accurion

Accurion nanofilm_ep4 as LDLS Setup

The nanofilm_ep4 uses a variety of unique features that allow the visualization of your surface in real time. This is the LDLS - Laser driven light...

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Accurion nanofilm_ep4 as Laser Setup

A selection of different lasers are available as a first and only light source in your single wavelength instrument. It can also been selected as a...

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Accurion nanofilm_ep4

Imaging: The new generation of microscopic thin film, surface and materials metrology tool uses a combination of auto nulling ellipsometry and...

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