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FEI Helios PFIB EFI

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EDS
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Focused Ion Beam
Type
FIB-SEM
DualBeam Plasma FIB platform for semiconductor failure analysis, process development and process control applications. With fully-integrated SEM and nano-probing capabilities, the Helios PFIB EFI delivers site-specific sample preparation, precision delayering and zero damage SEM end-pointing with in-situ precision probing for EBIC/EBAC and transistor characterization.

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