FEI Vion Plasma Focused Ion Beam
Xe ICP inductively coupled plasma
< 25 nm Image resolution
FIB Acceleration Voltage
2 - 30 kV
The FEI Vion™ Plasma Focused Ion Beam System (PFIB) adds significantly more capacity to your lab, with best-in-class milling and imaging performance in a single, easy-to-use instrument. By incorporating plasma ion source technology, the Vion PFIB delivers increased throughput over conventional gallium FIB instruments-with speeds more than 20x faster for site-specific cross-sectioning and large area milling, as well as sample preparation. With both excellent milling precision and high-resolution imaging at low beam currents, the Vion PFIB delivers the speed, accuracy and high contrast images essential for a wide range of process control, failure analysis or materials research applications.