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FEI Helios PFIB DualBeam for Materials Science

EM Resolution
1.0 @ 15kV
EM Magnification
inquire
EM Acceleration Voltage
0.05 - 30 kV (landing voltage)
EM Source
Schottky thermal field emitter
EDS
Optional
Focused Ion Beam
Type
FIB-SEM
Ion Gun
Xe Plasma Ion Source ICP
FIB Resolution
< 25 @ 30 kV at coincident point, statistical method
FIB Acceleration Voltage
2 - 30 kV (landing voltage)
The Helios PFIB DualBeam features FEI's most recent advances in Plasma Focused Ion Beam and field emission SEM (FESEM) technologies and their combined use. FEI's first plasma-based DualBeam is designed for high-throughput, large-volume processing, combined with extreme high-resolution imaging in both 2D and 3D.

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