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JEOL JIB-4601F

EM Resolution
1.2nm @ 30kV
EM Magnification
20x - 1.000.000x
EM Acceleration Voltage
0.1 - 30kV
EM Source
inquire
EDS
Optional
Focused Ion Beam
Type
FIB-SEM
Ion Gun
Ga Liquid Metal Ion Source
FIB Resolution
4 nm @ 30 kV (SIM)
FIB Acceleration Voltage
1 - 30 kV
The JIB-4601F focused ion beam system is a state-of-the-art, high-resolution, digital 2-beam focused ion beam system with newly designed ion optics, high-resolution field emission electron optics and an intuitive, graphic user interface (GUI). The JIB-4601F can be used to produce thin film cuts for STEM/TEM analyses as well as specimen cross sections for SEM analyses of very different materials which would otherwise be difficult, if not impossible, to prepare. Thanks to two separate beams, parallel operations are possible: the high-resolution ion column allows for the imaging and removal of material while, at the same time, the high-resolution electron column enables the imaging of the specimen surface. The combination of FIB source and electron column in a single system also facilitates the use of state-of-the-art technologies such as FIB tomography and 3D-EBSD.

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