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ZEISS ORION NanoFab Multiple Ion Beam Micrsocope

Ion Gun
Ga with Liquid Metal Ion Sourc
FIB Resolution
3 nm @ 30 kV (Ga); 1.9 nm (Ne); 0.5 nm (He)
FIB Acceleration Voltage
10 - 30 kV; up to 35 kV (He); 1 - 30kV (Ga)
Ion Gun II
He, Ne
3-in-1 Multibeam Ion Microscope for Sub-10nm Nanostructuring. Fabricate sub-10nm nanostructures with speed and precision. Seamlessly switch between gallium, neon and helium beams with ORION NanoFab:
Use the neon beam to machine nanostructures at great speed and achieve high throughput.Use the helium beam to create delicate sub-10 nm structures.
Use optional gallium FIB to remove massive material. With ORION NanoFab you profit from the only system in the world that covers the complete range of micromachining to nanomachining applications using gallium, neon and helium ion beams integrated in a single instrument.

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